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dc.creatorTan, Teng
dc.creatorWolak, M. A.
dc.creatorAcharya, Narendra
dc.creatorKrick, Alex
dc.creatorLang, Andrew C.
dc.creatorSloppy, Jennifer
dc.creatorTaheri, Mitra L.
dc.creatorCivale, L.
dc.creatorChen, Ke
dc.creatorXi, X. X.
dc.date.accessioned2023-06-22T15:11:21Z
dc.date.available2023-06-22T15:11:21Z
dc.date.issued2015-04-01
dc.identifier.citationTeng Tan, M. A. Wolak, Narendra Acharya, Alex Krick, Andrew C. Lang, Jennifer Sloppy, Mitra L. Taheri, L. Civale, Ke Chen, and X. X. Xi , "Enhancement of lower critical field by reducing the thickness of epitaxial and polycrystalline MgB2 thin films", APL Materials 3, 041101 (2015) https://doi.org/10.1063/1.4916696
dc.identifier.issn2166-532X
dc.identifier.doihttp://dx.doi.org/10.34944/dspace/8689
dc.identifier.urihttp://hdl.handle.net/20.500.12613/8725
dc.description.abstractFor potential applications in superconducting RF cavities, we have investigated the properties of polycrystalline MgB2 films, including the thickness dependence of the lower critical field Hc1. MgB2 thin films were fabricated by hybrid physical-chemical vapor deposition on (0001) SiC substrate either directly (for epitaxial films) or with a MgO buffer layer (for polycrystalline films). When the film thickness decreased from 300 nm to 100 nm, Hc1 at 5 K increased from around 600 Oe to 1880 Oe in epitaxial films and to 1520 Oe in polycrystalline films. The result is promising for using MgB2/MgO multilayers to enhance the vortex penetration field.
dc.format.extent8 pages
dc.languageEnglish
dc.language.isoeng
dc.relation.ispartofFaculty/ Researcher Works
dc.relation.haspartAPL Materials, Vol. 3, Iss. 4
dc.relation.isreferencedbyAIP Publishing
dc.rightsAttribution CC BY
dc.rights.urihttps://creativecommons.org/licenses/by/3.0/
dc.titleEnhancement of lower critical field by reducing the thickness of epitaxial and polycrystalline MgB2 thin films
dc.typeText
dc.type.genreJournal article
dc.description.departmentPhysics
dc.relation.doihttps://doi.org/10.1063/1.4916696
dc.ada.noteFor Americans with Disabilities Act (ADA) accommodation, including help with reading this content, please contact scholarshare@temple.edu
dc.description.schoolcollegeTemple University. College of Science and Technology
dc.creator.orcidTan|0000-0002-8217-6557
dc.creator.orcidAcharya|0000-0003-2297-2321
dc.temple.creatorTan, Teng
dc.temple.creatorWolak, M. A.
dc.temple.creatorAcharya, Narendra
dc.temple.creatorKrick, Alex
dc.temple.creatorChen, Ke
dc.temple.creatorXi, X. X.
refterms.dateFOA2023-06-22T15:11:21Z


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