MgB2 Josephson junctions produced by focused helium ion beam irradiation
Genre
Journal articleDate
2018-07-19Author
Kasaei, L.Melbourne, Thomas

Manichev, V.
Feldman, L. C.
Gustafsson, T.
Chen, Ke
Xi, X. X.
Davidson, Bruce

Group
Temple Materials InstituteDepartment
PhysicsSubject
Josephson effectSuperconducting devices
Helium ion beam lithography
Chemical vapor deposition
Boron compounds
Permanent link to this record
http://hdl.handle.net/20.500.12613/36
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https://doi.org/10.1063/1.5030751Abstract
Planar magnesium diboride Josephson junctions are fabricated using focused helium ion beam irradiation. A single track of ion irradiation with a 30 kV He+ beam with nominal beam diameter < 0.5 nm is used to create a normal-metal barrier on a MgB2 film deposited by hybrid physical-chemical vapor deposition. Josephson coupling is observed below the critical temperature of the electrodes for a He+ doses between 8x1015/cm2 to 4x1016/cm2 . Analysis of the temperature dependence of the normal resistance and critical voltage of the junctions shows highly uniform barriers with nearly ideal resistively-shunted junction behavior for higher-dose junctions, while nonequilibrium effects dominate the properties of lower-dose junctions over most of the temperature range. These results demonstrate that focused helium ion beam irradiation can produce high-quality proximity-coupled MgB2 Josephson junctions with tailorable properties, promising for use in superconducting devices and circuits.Citation
Kasaei, L., Melbourne, T., Manichev, V., Feldman, L. C., Gustafsson, T., Chen, Ke, Xi, X. X., Davidson, B. A. AIP Advances 8, 075020 (2018); https://doi.org/10.1063/1.5030751Citation to related work
American Institute of PhysicsHas part
AIP Advances, Vol. 8, No. 7ADA compliance
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http://dx.doi.org/10.34944/dspace/23