Structure and electronic properties of atomically-layered ultrathin nickelate films

Abstract

This work presents a study on stoichiometry and structure in perovskite-type oxide thin films and investigates the role of growth–induced defects on the properties of materials. It also explores the possibility to grow thin films with properties close or similar to the ideal bulk parent compound. A novel approach to the growth of thin films, atomic layer-by-layer (ALL) laser molecular beam epitaxy (MBE) using separate oxide targets is introduced to better control the assembly of each atomic layer and to improve interface perfection and stoichiometry. It also is a way to layer materials to achieve a new structure that does not exist in nature. This thesis is divided into three sections. In the first part, we use pulsed laser deposition (PLD) to grow LaAlO3 (LAO) thin films on SrTiO3 (STO) and LAO substrates in a broad range of laser energy density and oxygen pressure. Using x-ray diffraction (θ-2θ scan and reciprocal space mapping), transmission electron microscopy (TEM) and x-ray fluorescence (XRF) we studied stoichiometry and structure of LAO films as a function of growth parameters. We show deviation from bulk–like structure and composition when films are grown at oxygen pressures lower than 10-2 Torr. We conclude that the discussion of LAO/STO interfacial properties should include the effects of growth–induced defects in the LAO films when the deposition is conducted at low oxygen pressures, as is typically reported in the literature. In the second part, we describe a new approach to atomically layer the growth of perovskite oxides: (ALL) laser MBE, using separate oxide targets to grow materials as perfectly as possible starting from the first atomic layer. We use All laser MBE to grow Ruddlesden–Popper (RP) phase Lan+1NinO3n+1 with n = 1, 2, 3 and 4 and we show that this technique enables us to construct new layered materials (n=4). In the last and main section of this thesis, we use All laser MBE from separate oxide targets to build the LaNiO3 (LNO) films as near perfectly as possible by depositing one atomic layer at a time. We study the thickness dependent metal-insulator transition (MIT) in ultrathin LNO films on an LAO substrate. In LNO, the MIT occurs in thin films and superlattices that are only a few unit cells in thickness, the understanding of which remains elusive despite tremendous effort devoted to the subject. Quantum confinement and structure distortion have been evoked as the mechanism of the MIT; however, first-principle calculations show that LaNiO3 remains metallic even at one unit cell thickness. Here, we show that thicknesses of a few unit cells, growth–induced disorders such as cation stoichiometry, oxygen vacancies, and substrate-film interface quality will impact the film properties significantly. We find that a film as thin as 2 unit cells, with LaO termination, is metallic above 150 K. An oxygen K-edge feature in the x-ray absorption spectra is clearly inked to the transition to the insulating phase as well as oxygen vacancies. We conclude that dimensionality and strain are not sufficient to induce the MIT without the contribution of oxygen vacancies in LNO ultrathin films. Dimensionality, strain, crystallinity, cation stoichiometry, and oxygen vacancies are all indispensable ingredients in a true control of the electronic properties of nanoscale strongly–correlated materials.